The structure and optical characteristics of plasma enhanced chemical vapour deposited silicon oxide thin films /

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Bibliographic Details
Main Author: Tan, Kim Hee
Format: Thesis Book
Language:English
Published: 1997.
Subjects:
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008 930114s1997 my t 00 1 eng m
035 |a ACE-3234 
040 |a UMM 
090 |a QC176.9  |b P64Tan 
091 |a Microfiche 14429 
100 1 0 |a Tan, Kim Hee. 
245 1 4 |a The structure and optical characteristics of plasma enhanced chemical vapour deposited silicon oxide thin films /  |c Tan Kim Hee. 
260 |c 1997. 
300 |a v, 169 leaves :  |b ill. ;  |c 30 cm. 
500 |a Microfiche. Kuala Lumpur : University of Malaya Library, 2000. 2 fiches : negative ; 11 x 15 cm. 
502 |a Dissertation (M.Sc.) -- Fakulti Sains, Universiti Malaya, 1997. 
504 |a Includes bibliographical reference. 
650 0 |a Thin films  |x Optical properties. 
650 0 |a Thin films  |x Electric properties. 
650 0 |a Silicon oxide films. 
710 2 0 |a Universiti Malaya.  |b Fakulti Sains. 
948 |a 20/12/1997  |b 14/06/2002 
596 |a 1 
999 |a QC176.9 P64TAN  |w LC  |c 1  |i A507734545  |l STACKS  |m P01UTAMA  |r Y  |s Y  |t TESIS  |u 28/10/1998