Effect of rapid thermal annealing on rf sputtered silicon-silicon oxide systems /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
1997.
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| LEADER | 00825cam a2200229 a 4500 | ||
|---|---|---|---|
| 001 | u422595 | ||
| 003 | SIRSI | ||
| 008 | 980404s1997 si v 00 1 eng m | ||
| 035 | |a ACE-9015 | ||
| 040 | |a UMM | ||
| 090 | |a TK7871.15 |b S55Cho | ||
| 100 | 1 | 0 | |a Choo, Chong Kheng. |
| 245 | 1 | 0 | |a Effect of rapid thermal annealing on rf sputtered silicon-silicon oxide systems / |c by Choo Chong Kheng. |
| 260 | |c 1997. | ||
| 300 | |a xviii, 120 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Eng.) -- National University of Singapore, 1997. | ||
| 504 | |a Bibliography: leaves 109-117. | ||
| 650 | 0 | |a Silicon oxide films |x Effect of rapid thermal processing on | |
| 650 | 0 | |a Semiconductors |x Heat treatment | |
| 948 | |a 04/04/1998 |b 24/06/2002 | ||
| 596 | |a 1 | ||
| 999 | |a TK7871.15 S55CHO |w LC |c 1 |i A507504696 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 26/9/1998 | ||