Reliability investigation of MOS devices under high current impulse stressing /

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Bibliographic Details
Main Author: Teh, Gim Leong
Format: Thesis Book
Language:English
Published: 1998.
Subjects:
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LEADER 00800cam a2200229 a 4500
001 u430269
003 SIRSI
008 981014s1998 si v 00 1 eng m
035 |a ACF-9182 
040 |a UMM 
090 |a TK7871.99  |b M44Teh 
100 1 0 |a Teh, Gim Leong. 
245 1 0 |a Reliability investigation of MOS devices under high current impulse stressing /  |c by Teh Gim Leong. 
260 |c 1998. 
300 |a xix, 141 leaves :  |b ill. ;  |c 30 cm. 
502 |a Dissertation (M.Eng.) -- National University of Singapore, 1998. 
504 |a Bibliography: leaves 134-136. 
650 0 |a Metal oxide semiconductors  |x Reliability 
650 0 |a Metal oxide semiconductors  |x Testing 
948 |a 14/10/1998  |b 19/12/1998 
596 |a 1 
999 |a TK7871.99 M44TEH  |w LC  |c 1  |i A508249283  |l STACKS  |m P01UTAMA  |r Y  |s Y  |t TESIS  |u 7/1/1999