Growth of the transition metal silicides films from single source precursors by MOCVD /

Growth of the transition metal silicides films from single source precursors by MOCVD /

محفوظ في:

التفاصيل البيبلوغرافية
المؤلف الرئيسي:	Luo, Lan
التنسيق:	أطروحة كتاب
اللغة:	English
منشور في:	1998.
الموضوعات:	Silicides Metallic films. Chemical vapor deposition.
الوسوم:	إضافة وسم لا توجد وسوم, كن أول من يضع وسما على هذه التسجيلة!

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