Hot-carrier characterization of submicrometer MOS transistors : subthreshold degradation and channel-width effect /

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Bibliographic Details
Main Author: Qin, Wei Han
Format: Thesis Book
Language:English
Published: 1998.
Subjects:
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035 |a ACG-9106 
040 |a UMM 
090 |a TK7871.99  |b M44Qin 
100 1 0 |a Qin, Wei Han. 
245 1 0 |a Hot-carrier characterization of submicrometer MOS transistors :  |b subthreshold degradation and channel-width effect /  |c by Qin Wei Han. 
260 |c 1998. 
300 |a xvi, 118 leaves :  |b ill. ;  |c 30 cm. 
502 |a Dissertation (M.Eng.) -- National University of Singapore, 1998. 
504 |a Includes bibliographical references. 
650 0 |a Metal oxide semiconductor field-effect transistors. 
650 0 |a Hot carriers. 
948 |a 02/04/1999  |b 08/04/1999 
596 |a 1 
999 |a TK7871.99 M44QIN  |w LC  |c 1  |i A508384216  |l STACKS  |m P01UTAMA  |r Y  |s Y  |t TESIS  |u 12/4/1999