Ng, W. T. (1998). Degradation and annealing of electrically-stressed thin oxide in MOS devices.
Chicago Style (17th ed.) CitationNg, Wee Thong. Degradation and Annealing of Electrically-stressed Thin Oxide in MOS Devices. 1998.
MLA (8th ed.) CitationNg, Wee Thong. Degradation and Annealing of Electrically-stressed Thin Oxide in MOS Devices. 1998.
Warning: These citations may not always be 100% accurate.