APA引文

Ng, W. T. (1998). Degradation and annealing of electrically-stressed thin oxide in MOS devices.

Chicago Style (17th ed.) Citation

Ng, Wee Thong. Degradation and Annealing of Electrically-stressed Thin Oxide in MOS Devices. 1998.

MLA引文

Ng, Wee Thong. Degradation and Annealing of Electrically-stressed Thin Oxide in MOS Devices. 1998.

警告：這些引文格式不一定是100％准確.