The application of rapid thermal annealing to reduce leakage current of Ta2O5 /

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Bibliographic Details
Main Author: Qian, Pengwei
Format: Thesis Book
Language:English
Published: 1999.
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008 990804s1999 si v 00 1 eng
035 |a ACH-6995 
040 |a UMM 
090 |a TK7  |b NUS 1999 Qia 
100 1 0 |a Qian, Pengwei. 
245 1 4 |a The application of rapid thermal annealing to reduce leakage current of Ta2O5 /  |c by Qian Pengwei. 
260 |c 1999. 
300 |a vi, 110 leaves :  |b ill. ;  |c 30 cm. 
502 |a Dissertation (M.Eng.) -- National University of Singapore, 1999. 
504 |a Bibliography: leaf 104. 
948 |a 04/08/1999  |b 31/10/2002 
596 |a 1 
999 |a TK7 NUS 1999 QIA  |w LC  |c 1  |i A509000486  |l B_KOM4  |m P01UTAMA  |r Y  |s Y  |t TESIS  |u 9/11/2002  |o .PUBLIC. bkom 4 : 45706