A study of series resistance and effective channel mobility in LDD NMOSFET /
Saved in:
主要作者: | Oh, Gim Guan |
---|---|
格式: | Thesis 图书 |
语言: | English |
出版: |
2000
|
标签: |
添加标签
没有标签, 成为第一个标记此记录!
|
相似书籍
-
A study of long and short channel NMOSFET on threshold voltage /
由: Norseha Ariffin
出版: (2013) -
A study on hot carrier effect (HCE) on LDD n-MOSFET /
由: Haziezol Helmi Mohd Yusof
出版: (2013) -
A study on the hot-carrier degradation of wide and narrow channel nmosfet devices with recessed-locos isolation structures /
由: Yue, Jeffrey Mun Pun
出版: (2000) -
Characterization of 50nm NMOSFET / Aziddin Azman
由: Azman, Aziddin
出版: (2009) -
Quarter-micron process simulation and LDD structure optimization /
由: Wang, Yu
出版: (1997)