A study on the hot-carrier degradation of wide and narrow channel nmosfet devices with recessed-locos isolation structures /

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Bibliographic Details
Main Author: Yue, Jeffrey Mun Pun
Format: Thesis Book
Language:English
Published: 2000.
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035 |a ACP-1780 
040 |a UMM 
090 |a TK7  |b NUS 2000 Yue 
100 1 0 |a Yue, Jeffrey Mun Pun. 
245 1 2 |a A study on the hot-carrier degradation of wide and narrow channel nmosfet devices with recessed-locos isolation structures /  |c Yue Mun Pun Jeffrey. 
260 |c 2000. 
300 |a xviii, 144 leaves :  |b ill. ;  |c 30 cm. 
500 |a Photocopy. 
502 |a Dissertation (M.Eng.) -- National University of Singapore, 2000. 
504 |a Bibliography: leaves 137-144. 
948 |a 11/05/2001  |b 07/11/2002 
596 |a 1 
999 |a TK7 NUS 2000 YUE  |w LC  |c 1  |i A510864701  |d 6/10/2007  |e 6/10/2007  |l B_KOM4  |m P01UTAMA  |n 1  |r Y  |s Y  |t TESIS  |u 15/11/2002  |o .PUBLIC. BKOM 4 : 45316