Inductively coupled plasma etching of silicon /

Saved in:
Bibliographic Details
Main Author: Xu, Xinhai
Format: Thesis Book
Language:English
Published: 2002.
Tags: Add Tag
No Tags, Be the first to tag this record!
LEADER 00674cam a2200205 a 4500
001 u505666
003 SIRSI
008 020917s2002 si v 00 1 eng m
035 |a ACW-0487 
040 |a UMM 
090 |a TK7  |b NUS 2002 Xu 
100 1 0 |a Xu, Xinhai. 
245 1 0 |a Inductively coupled plasma etching of silicon /  |c Xu Xinhai. 
260 |c 2002. 
300 |a xiii, 126 leaves :  |b ill. ;  |c 30 cm. 
502 |a Dissertation (M.Eng.) -- National University of Singapore, 2002. 
504 |a Bibliography: leaves 111-126. 
948 |a 22/10/2002  |b 24/12/2002 
596 |a 1 
999 |a TK7 NUS 2002 XU  |w LC  |c 1  |i A510949941  |l B_KOM4  |m P01UTAMA  |r Y  |s Y  |t TESIS  |u 16/1/2003  |o .PUBLIC. BKOM 4 : 46035