Kok, K. (2002). Techniques of etching high aspect ratio trenches for mems applications.
Chicago Style (17th ed.) CitationKok, Kitt-Wai. Techniques of Etching High Aspect Ratio Trenches for Mems Applications. 2002.
MLA引文Kok, Kitt-Wai. Techniques of Etching High Aspect Ratio Trenches for Mems Applications. 2002.
警告:這些引文格式不一定是100%准確.