Characterisation of Ta2O5 thin films for sub-0.25 um applications /
Saved in:
Main Author: | Tay, Mark Gek Leng |
---|---|
Format: | Thesis Book |
Language: | English |
Published: |
2000.
|
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Characterisation of Ta2O5 thin films for sub-0.25um applications /
by: Tay, Mark Gek Leng
Published: (2000) -
Integration of Cu interconnects for sub-0.25 um manufacturing /
by: Yap, Kuan Pei
Published: (1999) -
From chelating precursors to La0.05Sr0.95CoO3-Y oxide powders and thin films /
by: Guo, Feng
Published: (1999) -
Photoresist trimming technique in high-density oxygen-based plasmas for sub-0.1 um mosfet fabrication using 248-nm lithography /
by: Sin, Chian Yuh
Published: (2002) -
Fabrication and characterization of Ag/Pd metallized La0.2Sr0.8C0O3-0 ceramic electrolyte membrance /
by: Liu, Yuanyuan
Published: (2003)