Development of ultra-thin nitrogen-rich gate oxide process for deep submicron CMOS technology /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
2002.
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| LEADER | 00731nam a2200205 a 4500 | ||
|---|---|---|---|
| 001 | u511901 | ||
| 003 | SIRSI | ||
| 008 | 000224s2002 si v 00 10 eng m | ||
| 035 | |a ACX-8981 | ||
| 040 | |a UMM | ||
| 090 | |a TK7 |b NUS 2002 Lek | ||
| 100 | 1 | 0 | |a Lek, Chun Meng. |
| 245 | 1 | 0 | |a Development of ultra-thin nitrogen-rich gate oxide process for deep submicron CMOS technology / |c Lek Chun Meng. |
| 260 | |c 2002. | ||
| 300 | |a xvi, 129 leaves : |b ill. ; |c 30 cm. | ||
| 502 | |a Dissertation (M.Eng.) -- National University of Singapore, 2002. | ||
| 504 | |a Bibliography: leaves 113-122. | ||
| 948 | |a 16/05/2003 |b 16/05/2003 | ||
| 596 | |a 1 | ||
| 999 | |a TK7 NUS 2002 LEK |w LC |c 1 |i A509836744 |l B_KOM4 |m P01UTAMA |r Y |s Y |t TESIS |u 24/5/2003 |o .PUBLIC. BKOM 4 : 45951 | ||