Cha, C. L. (2001). Plasma process-induced damage to oxide/nitride/oxide (ONO) interpoly dielectric in flash memory devices.
Chicago Style (17th ed.) CitationCha, Cher Liang. Plasma Process-induced Damage to Oxide/nitride/oxide (ONO) Interpoly Dielectric in Flash Memory Devices. 2001.
MLA (8th ed.) CitationCha, Cher Liang. Plasma Process-induced Damage to Oxide/nitride/oxide (ONO) Interpoly Dielectric in Flash Memory Devices. 2001.
Warning: These citations may not always be 100% accurate.