APA引文

Cha, C. L. (2001). Plasma process-induced damage to oxide/nitride/oxide (ONO) interpoly dielectric in flash memory devices.

Chicago Style (17th ed.) Citation

Cha, Cher Liang. Plasma Process-induced Damage to Oxide/nitride/oxide (ONO) Interpoly Dielectric in Flash Memory Devices. 2001.

MLA引文

Cha, Cher Liang. Plasma Process-induced Damage to Oxide/nitride/oxide (ONO) Interpoly Dielectric in Flash Memory Devices. 2001.

警告：这些引文格式不一定是100％准确.