APA (7th ed.) Citation

Ho, C. S. (2002). Integration of self-aligned silicide (salicide) process for sub-0.25 [mu]m CMOS technology.

Chicago Style (17th ed.) Citation

Ho, Chaw Sing. Integration of Self-aligned Silicide (salicide) Process for Sub-0.25 [mu]m CMOS Technology. 2002.

MLA (8th ed.) Citation

Ho, Chaw Sing. Integration of Self-aligned Silicide (salicide) Process for Sub-0.25 [mu]m CMOS Technology. 2002.

Warning: These citations may not always be 100% accurate.