Hydrogenated amorphous silicon prepared by d.c. plasma enhanced chemical vapour deposition of helium diluted silane /

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Bibliographic Details
Main Author: Roszairi Haron
Format: Thesis Book
Language:English
Published: 2004.
Subjects:
Online Access:http://studentsrepo.um.edu.my/id/eprint/1613
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100 0 0 |a Roszairi Haron 
245 1 0 |a Hydrogenated amorphous silicon prepared by d.c. plasma enhanced chemical vapour deposition of helium diluted silane /  |c Roszairi bin Haron. 
260 |c 2004. 
300 |a xii, 160 leaves :  |b ill. ;  |c 30 cm. 
502 |a Dissertation (M.Sc.) -- Jabatan Fizik, Fakulti Sains, Universiti Malaya, 2004. 
504 |a Includes bibliographical references. 
650 0 |a Plasma-enhanced chemical vapor deposition. 
650 0 |a Amorphous semiconductors  |x Optical properties 
650 0 |a Amorphous semiconductors  |x Electric properties. 
710 2 0 |a Universiti Malaya.  |b Jabatan Fizik 
856 4 1 |u http://studentsrepo.um.edu.my/id/eprint/1613 
596 |a 1 
999 |a QC3 UM 2004 ROSH  |w LC  |c 1  |i A511765521  |d 27/9/2005  |f 27/9/2005  |g 1  |l STACKS  |m P01UTAMA  |r Y  |s Y  |t TESIS  |u 21/9/2005