Hydrogenated amorphous silicon by pulsed plasma enhanced chemical vapour deposition technique /
Saved in:
Main Author: | Goh, Boon Tong |
---|---|
Format: | Thesis Book |
Language: | English |
Published: |
2005.
|
Subjects: | |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Hydrogenated amorphous silicon prepared by d.c. plasma enhanced chemical vapour deposition of helium diluted silane /
by: Roszairi Haron
Published: (2004) -
Amorphous silicon (a-Si:H)/silicon nitride (a-SiNx:H) superlattice by D.C. plasma enhanced chemical vapour deposition : preparation and characterization /
by: Mitani, Sufian Mousa Ibrahim
Published: (2004) -
Effect of annealing on direct current and pulse PECVD hydrogenated amorphous silicon /
by: Lim, Seck Chai
Published: (2004) -
PECVD hydrogenated amorphous carbon films : growth and characterization /
by: Rozidawati Awang
Published: (2008) -
Hot-wire plasma enhanced chemical vapour deposition system for preparation of silicon carbide thin films /
by: Aniszawati Azis
Published: (2012)