Amorphous silicon (a-Si:H)/silicon nitride (a-SiNx:H) superlattice by D.C. plasma enhanced chemical vapour deposition : preparation and characterization /
Saved in:
主要作者: | Mitani, Sufian Mousa Ibrahim |
---|---|
格式: | Thesis 圖書 |
語言: | English |
出版: |
2004.
|
主題: | |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
相似書籍
-
Hydrogenated amorphous silicon by pulsed plasma enhanced chemical vapour deposition technique /
由: Goh, Boon Tong
出版: (2005) -
Hydrogenated amorphous silicon prepared by d.c. plasma enhanced chemical vapour deposition of helium diluted silane /
由: Roszairi Haron
出版: (2004) -
Effect of annealing on direct current and pulse PECVD hydrogenated amorphous silicon /
由: Lim, Seck Chai
出版: (2004) -
Direct-current plasma glow discharged hydrogenated SiNx alloys : deposition and physical studies /
由: Faidz Abd. Rahman
出版: (1996) -
Plasma enhanced chemical vapour deposition of carbon nitride films from ethane and nitrogen gas mixtures /
由: Maisara Othman
出版: (2012)