Goh, C. L. (2006). A study of stress in backend metallization in ULSI devices.
Chicago Style (17th ed.) CitationGoh, Chia Lan. A Study of Stress in Backend Metallization in ULSI Devices. 2006.
MLA引文Goh, Chia Lan. A Study of Stress in Backend Metallization in ULSI Devices. 2006.
警告:這些引文格式不一定是100%准確.