APA引文

Lau, S. Y. Study on alignment capability and overlay performance in back-end of line lithography process for 130nm technology.

Chicago Style (17th ed.) Citation

Lau, Siau Yen. Study on Alignment Capability and Overlay Performance in Back-end of Line Lithography Process for 130nm Technology.

MLA引文

Lau, Siau Yen. Study on Alignment Capability and Overlay Performance in Back-end of Line Lithography Process for 130nm Technology.

警告：这些引文格式不一定是100％准确.