Shi, C. H. (2008). Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition.
توثيق أسلوب شيكاغو (الطبعة السابعة عشر)Shi, Chee Han. Influence of RF Power and Hidrogen Dilution on the Optical and Structural Properties of Hydrogenated Silicon Thin Films Deposited by RF Plasma Enhanced Chemical Vapour Deposition. 2008.
توثيق جمعية اللغة المعاصرة MLA (الطبعة الثامنة)Shi, Chee Han. Influence of RF Power and Hidrogen Dilution on the Optical and Structural Properties of Hydrogenated Silicon Thin Films Deposited by RF Plasma Enhanced Chemical Vapour Deposition. 2008.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.