Shi, C. H. (2008). Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition.
Chicago Style (17th ed.) CitationShi, Chee Han. Influence of RF Power and Hidrogen Dilution on the Optical and Structural Properties of Hydrogenated Silicon Thin Films Deposited by RF Plasma Enhanced Chemical Vapour Deposition. 2008.
MLA引文Shi, Chee Han. Influence of RF Power and Hidrogen Dilution on the Optical and Structural Properties of Hydrogenated Silicon Thin Films Deposited by RF Plasma Enhanced Chemical Vapour Deposition. 2008.
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