Physical properties of hydrogenated silicon (Si:H) thin films : the effect of RF power during deposition /
Saved in:
主要作者: | Ramlee Adnan |
---|---|
格式: | Thesis 圖書 |
語言: | English |
出版: |
2008.
|
主題: | |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
相似書籍
-
Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition /
由: Shi, Chee Han
出版: (2008) -
Effects of hydrogen dilution of silane on the optical and photoluminescence properties of hydrogenated nanocrystalline silicon thin films /
由: Tang, Show Yih
出版: (2008) -
Deposition of diamond and diamondlike carbon films using RF plasma /
由: Tan, Chian Hong
出版: (2004) -
Fabrication and characterization of zinc oxide thin films for optoelectronic applications /
由: Siti Hajar Basri
出版: (2017) -
Direct-current plasma glow discharged hydrogenated SiNx alloys : deposition and physical studies /
由: Faidz Abd. Rahman
出版: (1996)