Optimization of inductively coupled plasma dry etching for planar waveguide fabrication /
Saved in:
Main Author: | Lim, Weng Hong |
---|---|
Format: | Thesis Book |
Language: | English |
Published: |
2010.
|
Subjects: | |
Online Access: | http://studentsrepo.um.edu.my/id/eprint/4307 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Inductively coupled plasma dry etching process on planar lightwave circuit fabrication /
by: Chuah, Khoon Seah
Published: (2010) -
Laser cleaning of plasma-etch-induced polymers from via holes and other submicron structures on silicon wafers /
by: Lee, Yuan Ping
Published: (1998) -
Plasma charge damage in submicron process /
by: Song, Jun
Published: (1999) -
Characterization of an inductively coupled plasma produced in argon at 13.56 MHz /
by: Lim, Ai Nuan
Published: (2010) -
Studies on a planar coil inductively coupled plasma system and its applications /
by: Kok, Yip Cheong
Published: (1997)