Aniszawati Azis. (2012). Hot-wire plasma enhanced chemical vapour deposition system for preparation of silicon carbide thin films.
Chicago Style (17th ed.) CitationAniszawati Azis. Hot-wire Plasma Enhanced Chemical Vapour Deposition System for Preparation of Silicon Carbide Thin Films. 2012.
MLA引文Aniszawati Azis. Hot-wire Plasma Enhanced Chemical Vapour Deposition System for Preparation of Silicon Carbide Thin Films. 2012.
警告:这些引文格式不一定是100%准确.