Hot-wire plasma enhanced chemical vapour deposition system for preparation of silicon carbide thin films /

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Bibliographic Details
Main Author: Aniszawati Azis
Format: Thesis Book
Language:English
Published: 2012.
Subjects:
Online Access:http://studentsrepo.um.edu.my/id/eprint/3841
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040 |a UMM  |d AUM  |e rda 
090 |a Q180  |b UMP 2012 Ania 
100 0 |a Aniszawati Azis. 
245 1 0 |a Hot-wire plasma enhanced chemical vapour deposition system for preparation of silicon carbide thin films /  |c Aniszawati binti Azis. 
260 |c 2012. 
300 |a xvi, 155 leaves :  |b ill. ;  |c 30 cm. 
502 |a Thesis (Ph.D) -- Institut Pengajian Siswazah, Universiti Malaya, 2012. 
504 |a Bibliography: leaves 128-135. 
530 |a Also issued in CD. 
650 0 |a Silicon-carbide thin films. 
650 0 |a Plasma-enhanced chemical vapor deposition. 
650 0 |a Chemical vapor deposition. 
710 2 |a Universiti Malaya.  |b Institut Pengajian Siswazah. 
856 4 1 |u http://studentsrepo.um.edu.my/id/eprint/3841 
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