Hybrid Plasma Enhanced Chemical Vapour Deposition/sputtering system for preparation of luminescent silicon carbon films /

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Bibliographic Details
Main Author: Nur Maisarah Abdul Rashid
Format: Thesis Book
Language:English
Published: 2013.
Subjects:
Online Access:http://studentsrepo.um.edu.my/id/eprint/4414
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100 0 |a Nur Maisarah Abdul Rashid. 
245 1 0 |a Hybrid Plasma Enhanced Chemical Vapour Deposition/sputtering system for preparation of luminescent silicon carbon films /  |c Nur Maisarah binti Abdul Rashid. 
260 |c 2013. 
300 |a xv, 109 leaves :  |b ill. ;  |c 30 cm 
502 |a Dissertation (M.Sc.) -- Jabatan Fizik, Fakulti Sains, Universiti Malaya, 2013. 
504 |a Bibliography: leaves 102-109 
530 |a Also issued in CD. 
650 0 |a Sputtering (Physics). 
650 0 |a Plasma-enhanced chemical vapor deposition. 
650 0 |a Thin films  |x Design and construction 
650 0 |a Thin films  |x Surfaces  |x Analysis. 
650 0 |a Thin films  |x Optical properties. 
650 0 |a Thin films  |x Materials. 
710 2 |a Universiti Malaya.  |b Jabatan Fizik. 
856 4 1 |u http://studentsrepo.um.edu.my/id/eprint/4414 
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596 |a 1 25 
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