Plasma enhanced chemical vapour deposition of carbon nitride films from ethane and nitrogen gas mixtures /
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| Main Author: | |
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| Format: | Thesis Book |
| Language: | English |
| Published: |
2012.
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| Subjects: | |
| Online Access: | http://studentsrepo.um.edu.my/id/eprint/4346 |
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|---|---|---|---|
| 001 | u988280 | ||
| 003 | SIRSI | ||
| 005 | 201401271221 | ||
| 008 | 140127s2012 my a t 000 0 eng m | ||
| 040 | |a UMM |d AUM |e rda | ||
| 090 | |a QC3 |b UM 2012 Maio | ||
| 100 | 0 | |a Maisara Othman, |e author. | |
| 245 | 1 | 0 | |a Plasma enhanced chemical vapour deposition of carbon nitride films from ethane and nitrogen gas mixtures / |c Maisara Binti Othman. |
| 264 | 1 | |c 2012. | |
| 264 | 4 | |c 2012. | |
| 300 | |a xiii, 125 leaves : |b illustrations ; |c 30 cm. | ||
| 336 | |a text |2 rdacontent | ||
| 337 | |a unmediated |2 rdamedia | ||
| 338 | |a volume |2 rdacarrier | ||
| 502 | |b M.Sc. |c Jabatan Fizik, Fakulti Sains, Universiti Malaya |d 2012. | ||
| 504 | |a Bibliography: leaves 118-125. | ||
| 530 | |a Also issued in CD. | ||
| 650 | 0 | |a Plasma-enhanced chemical vapor deposition. | |
| 650 | 0 | |a Thin films. | |
| 650 | 0 | |a Nitriding. | |
| 710 | 2 | |a Universiti Malaya. |b Jabatan Fizik, |e degree granting institution. | |
| 856 | 4 | 1 | |u http://studentsrepo.um.edu.my/id/eprint/4346 |
| 900 | |a HA-ZA | ||
| 596 | |a 1 25 | ||
| 999 | |a QC3 UM 2012 MAIO |w LC |c 1 |i A515711306 |d 11/5/2015 |f 11/5/2015 |g 1 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 29/4/2015 | ||
| 999 | |a QC3 UM 2012 MAIO |w LC |c 1 |i A515868621 |f 25/1/2021 |g 1 |l STACKS |m P25UMARCHI |r N |s Y |t CD |u 29/7/2015 |1 STEM | ||