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  1. 1
    Characterizing the channel interface properties of vertical double-diffused metal-oxide semiconductor (DMOS) with charge pumping method /
    Subjects: “...Metal oxide semiconductors Materials....”
    Thesis Book
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  2. 2
    Process integration issues of self-aligned titanium silicide technology (Ti-Salicide) in deep sub-micron CMOS devices fabrication /
    by Lim, Chong Wee
    Published 1998
    Subjects: “...Metal oxide semiconductors, Complementary Design...”
    Thesis Book
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