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  1. 1
    Hydrogenated silicon nitride alloy from DC plasma decomposition : preparation and physical properties /
    by Raihan Othman
    Published 1998
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  2. 2
    Direct-current plasma glow discharged hydrogenated SiNx alloys : deposition and physical studies /
    by Faidz Abd. Rahman
    Published 1996
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  3. 3
    Layer-by-layer plasma enhanced chemical vapour deposition of nanocrystalline silicon thin films /
    by Goh, Boon Tong
    Published 2012
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  4. 4
    Structure, morphology and wettability properties of carbon nitride nanostructures deposited by plasma enhanced chemical vapour deposition technique /
    by Shafarina Azlinda Ahmad Kamal
    Published 2016
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  5. 5
    Hot-filament plasma enhanced chemical vapour deposition of transfer-free graphene using nickel catalyst /
    by Maisara Othman
    Published 2019
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  6. 6
    Hydrogenated amorphous silicon prepared by d.c. plasma enhanced chemical vapour deposition of helium diluted silane /
    by Roszairi Haron
    Published 2004
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  7. 7
    Hydrogenated amorphous silicon by pulsed plasma enhanced chemical vapour deposition technique /
    by Goh, Boon Tong
    Published 2005
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  8. 8
    Effect of annealing on direct current and pulse PECVD hydrogenated amorphous silicon /
    by Lim, Seck Chai
    Published 2004
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  9. 9
    Synthesis and characterization of RF-PECVD carbon nitride thin films /
    by Lim, Shuang Fang
    Published 1999
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  10. 10
    Amorphous silicon (a-Si:H)/silicon nitride (a-SiNx:H) superlattice by D.C. plasma enhanced chemical vapour deposition : preparation and characterization /
    by Mitani, Sufian Mousa Ibrahim
    Published 2004
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  11. 11
    Effects of hydrogen dilution of silane on the optical and photoluminescence properties of hydrogenated nanocrystalline silicon thin films /
    by Tang, Show Yih
    Published 2008
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  12. 12
    PECVD hydrogenated amorphous carbon films : growth and characterization /
    by Rozidawati Awang
    Published 2008
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  13. 13
    Hot-wire plasma enhanced chemical vapour deposition system for preparation of silicon carbide thin films /
    by Aniszawati Azis
    Published 2012
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  14. 14
    Influence of hydrogenated amorphous carbon underlayer film on the formation of carbon nitride nanostructures /
    by Noor Hamizah Khanis
    Published 2013
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  15. 15
    Hybrid Plasma Enhanced Chemical Vapour Deposition/sputtering system for preparation of luminescent silicon carbon films /
    by Nur Maisarah Abdul Rashid
    Published 2013
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  16. 16
    Plasma enhanced chemical vapour deposition of carbon nitride films from ethane and nitrogen gas mixtures /
    by Maisara Othman
    Published 2012
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