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  1. 1
    Process integration issues of self-aligned titanium silicide technology (Ti-Salicide) in deep sub-micron CMOS devices fabrication /
    by Lim, Chong Wee
    Published 1998
    Thesis Book
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  2. 2
    Enhanced stability of nickel silicide for advanced CMOS silicon technologies /
    by Lee, Pooi See
    Published 2001
    Thesis Book
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  3. 3
    Integration of self-aligned silicide (salicide) process for sub-0.25 [mu]m CMOS technology /
    by Ho, Chaw Sing
    Published 2002
    Thesis Book
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