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  1. 1
    Characterization of an inductively coupled plasma produced in argon at 13.56 MHz /
    由 Lim, Ai Nuan
    出版 2010
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  2. 2
    Electrical characteristics of a direct current glow discharge system /
    由 Siti Sarah Safaai
    出版 2009
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  3. 3
    Langmuir probe measurement in a radio frequency inductively coupled argon plasma /
    由 Ong, Chun Lian
    出版 2003
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  4. 4
    Influence of RF power and hidrogen dilution on the optical and structural properties of hydrogenated silicon thin films deposited by RF plasma enhanced chemical vapour deposition /
    由 Shi, Chee Han
    出版 2008
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  5. 5
    Physical properties of hydrogenated silicon (Si:H) thin films : the effect of RF power during deposition /
    由 Ramlee Adnan
    出版 2008
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