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Integrated circuits
3
Ultra large scale integration
3
Design
1
Dielectric devices
1
Dielectrics
1
Electric power distribution
1
Materials
1
Metal oxide semiconductors, Complementary
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Silicides
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Strains and stresses
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Technique
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Titanium
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A study of stress in backend metallization in ULSI devices /
由
Goh, Chia Lan
出版 2006
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Process integration issues of self-aligned titanium silicide technology (Ti-Salicide) in deep sub-micron CMOS devices fabrication /
由
Lim, Chong Wee
出版 1998
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Probing technique for energy distribution of positive charges in gate dielectrics and its application to lifetime prediction /
由
Sharifah Fatmadiana Wan Muhamad Hatta
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机构
Universiti Malaya
3
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Catalog
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作者
Goh, Chia Lan
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Lim, Chong Wee
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Sharifah Fatmadiana Wan Muhamad Hatta
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Universiti Malaya.
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English
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