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Design
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Integrated circuits
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Metal oxide semiconductors, Complementary
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Silicides
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Titanium
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Ultra large scale integration
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Process integration issues of self-aligned titanium silicide technology (Ti-Salicide) in deep sub-micron CMOS devices fabrication /
由
Lim, Chong Wee
出版 1998
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Universiti Malaya
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Lim, Chong Wee
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