Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices

Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices

High spped performance in VLSI devices requires the use of semiconductor materials such as copper interconnects and low-k dielectric. Low-k dielectric can reduce the parasitic capacitance between two metal lines, which allows higher operational speed as compared to silicon oxide.

Saved in:
Bibliographic Details
Main Author: Wong, Man On
Format: Thesis
Published: 2006
Subjects:
TK7800-8360 Electronics
Tags: Add Tag
No Tags, Be the first to tag this record!
id my-mmu-ep.1124
record_format uketd_dc
spelling my-mmu-ep.11242010-08-23T03:47:22Z Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices 2006-05 Wong, Man On TK7800-8360 Electronics High spped performance in VLSI devices requires the use of semiconductor materials such as copper interconnects and low-k dielectric. Low-k dielectric can reduce the parasitic capacitance between two metal lines, which allows higher operational speed as compared to silicon oxide. 2006-05 Thesis http://shdl.mmu.edu.my/1124/ http://myto.perpun.net.my/metoalogin/logina.php masters Multimedia University Research Library
institution Multimedia University
collection MMU Institutional Repository
topic TK7800-8360 Electronics
spellingShingle TK7800-8360 Electronics
Wong, Man On
Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices
description High spped performance in VLSI devices requires the use of semiconductor materials such as copper interconnects and low-k dielectric. Low-k dielectric can reduce the parasitic capacitance between two metal lines, which allows higher operational speed as compared to silicon oxide.
format Thesis
qualification_level Master's degree
author Wong, Man On
author_facet Wong, Man On
author_sort Wong, Man On
title Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices
title_short Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices
title_full Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices
title_fullStr Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices
title_full_unstemmed Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices
title_sort study of msq as low-k dielectric material for semiconductor devices
granting_institution Multimedia University
granting_department Research Library
publishDate 2006
_version_ 1747829296583409664

Similar Items