Development Of Ternary Ni-Ag-P And Ni-Cu-P Using Electroless Coating On Copper Substrate
Current functional test of assembled device in semiconductor industry use thermal interface media but it occasionally caused cosmetic defects such as stain or scratch mark. A possible solution to eliminate the undesired defects is by improving the nickel-phosphorus (Ni-P) coating currently applied o...
محفوظ في:
المؤلف الرئيسي: | Md Sani, Nur Ariffah |
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التنسيق: | أطروحة |
اللغة: | English |
منشور في: |
2015
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الموضوعات: | |
الوصول للمادة أونلاين: | http://eprints.usm.my/46917/1/Development%20Of%20Ternary%20Ni-Ag-P%20And%20Ni-Cu-P%20Using%20Electroless%20Coating%20On%20Copper%20Substrate.pdf |
الوسوم: |
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مواد مشابهة
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A study of temperatures effect on electroless Ni-P deposition /
بواسطة: Suzana Mohezar Ali -
Electroless deposition of Co-Ni-P alloys from a solution of 30% Co: 70% Ni /
بواسطة: Chen, Sheau Huey
منشور في: (2007) -
Electroless Co-Ni-P ternary alloy plating on aluminium metal in alkaline medium using bath solution with ionic Co[2+]:Ni[2+] ratio of 7:3 /
بواسطة: Low, Wai Leon
منشور في: (2007) -
Performance evaluation of copper brazing using CU-NI-Sn-P filler metal /
بواسطة: Mohd Zubir Md Idris
منشور في: (2017) -
Brazing of porous copper with copper substrate by using CU-7NI-9.3SN-6.3P as a filler /
بواسطة: Fauziah Mohamed Roshidi
منشور في: (2014)