Optimization of physical vapour deposition coating process parameters using genetic algorithm
Optimization of thin film coating parameter is an important task to identify the required output. In the process of physical vapor deposition (PVD), two main issues of the PVD process are cost of manufacturing and customization of the cutting tool properties. In general, a proper choice of the coati...
محفوظ في:
| المؤلف الرئيسي: | |
|---|---|
| التنسيق: | أطروحة |
| اللغة: | English English |
| منشور في: |
2014
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| الموضوعات: | |
| الوصول للمادة أونلاين: | http://eprints.utem.edu.my/id/eprint/14993/1/Optimization%20Of%20Physical%20Vapour%20Deposition%20Coating%20Process%20Parameters%20Using%20Genetic%20Algorithm%2024pages.pdf http://eprints.utem.edu.my/id/eprint/14993/2/Optimization%20of%20physical%20vapour%20deposition%20coating%20process%20parameters%20using%20genetic%20algorithm.pdf |
| الوسوم: |
إضافة وسم
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الانترنت
http://eprints.utem.edu.my/id/eprint/14993/1/Optimization%20Of%20Physical%20Vapour%20Deposition%20Coating%20Process%20Parameters%20Using%20Genetic%20Algorithm%2024pages.pdfhttp://eprints.utem.edu.my/id/eprint/14993/2/Optimization%20of%20physical%20vapour%20deposition%20coating%20process%20parameters%20using%20genetic%20algorithm.pdf