A crystallographic optimization study in Ta TaN bi-layer sputtering to reduce semiconductor manufacturing queue time constraint

A crystallographic optimization study in Ta TaN bi-layer sputtering to reduce semiconductor manufacturing queue time constraint

The Physical Vapor Deposition (PVD) magnetron sputtering method is the most extensively used technique for depositing metallic thin film in the semiconductor wafer fabrication industry. The PVD equipment manufacturer has specified stringent control, in this case, a queue time restriction between the...

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書目詳細資料
主要作者:	Ahmad, Anuar Fadzil
格式:	Thesis
語言:	English English
出版:	2022
主題:	T Technology (General) TS Manufactures
在線閱讀:	http://eprints.utem.edu.my/id/eprint/26909/1/A%20crystallographic%20optimization%20study%20in%20Ta%20TaN%20bi-layer%20sputtering%20to%20reduce%20semiconductor%20manufacturing%20queue%20time%20constraint.pdf http://eprints.utem.edu.my/id/eprint/26909/2/A%20crystallographic%20optimization%20study%20in%20Ta%20TaN%20bi-layer%20sputtering%20to%20reduce%20semiconductor%20manufacturing%20queue%20time%20constraint.pdf
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