Study and analysis of surface charge collection and emission spectrum of plasma ashing process
This research presents an important observation on the total surface charge collection using quantox wafers through the measurement of surface voltage (Vs) on wafer surface with contactless Kelvin Probe for changes in parameters during plasma ashing. In this report, it is covered on the plasma chara...
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| 主要作者: | |
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| 格式: | Thesis |
| 語言: | English English English |
| 出版: |
2019
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| 主題: | |
| 在線閱讀: | http://eprints.uthm.edu.my/533/1/24p%20KANTHAAN%20SIVAPATHY.pdf http://eprints.uthm.edu.my/533/2/KANTHAAN%20SIVAPATHY%20COPYRIGHT%20DECLARATION.pdf http://eprints.uthm.edu.my/533/3/KANTHAAN%20SIVAPATHY%20WATERMARK.pdf |
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