Aluminium nitride (AlN) as buffer layer for deposition of gallium nitride (GaN) thin films on silicon substrates using magnetron sputtering technique

Group III-nitrides semiconductors composed of gallium nitride (GaN), Indium nitride (InN), and aluminium nitride (AlN) had found use in broad technologies especially in optoelectronic and power devices. The main issues that limit the performance of GaN-based ultraviolet light-emitting diodes (UV-LED...

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主要作者: Tahan, Muliana
格式: Thesis
语言:English
English
English
出版: 2021
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在线阅读:http://eprints.uthm.edu.my/989/1/24p%20MULIANA%20BINTI%20TAHAN.pdf
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