Phase change analysis of crystalline silicon thin film grown by very high frequency - plasma enhanced chemical vapour deposition and radio frequency - magnetron sputtering

In this study, silicon thin films had been successfully produced by using Very High Frequency-Plasma Enhanced Chemical Vapour Deposition (VHF-PECVD) technique. The phase transition from amorphous to crystalline silicon along with crystallite types remains unknown, especially at VHF region up to 200...

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Bibliographic Details
Main Author: Rosman, Nor Hariz Kadir
Format: Thesis
Published: 2020
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