Phase change analysis of crystalline silicon thin film grown by very high frequency - plasma enhanced chemical vapour deposition and radio frequency - magnetron sputtering

Phase change analysis of crystalline silicon thin film grown by very high frequency - plasma enhanced chemical vapour deposition and radio frequency - magnetron sputtering

In this study, silicon thin films had been successfully produced by using Very High Frequency-Plasma Enhanced Chemical Vapour Deposition (VHF-PECVD) technique. The phase transition from amorphous to crystalline silicon along with crystallite types remains unknown, especially at VHF region up to 200...

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書目詳細資料
主要作者:	Rosman, Nor Hariz Kadir
格式:	Thesis
語言:	English
出版:	2020
主題:	Q Science (General)
在線閱讀:	http://eprints.utm.my/id/eprint/101483/1/NorHarizKadirRosmanMFS2020.pdf
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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