Phase change analysis of crystalline silicon thin film grown by very high frequency - plasma enhanced chemical vapour deposition and radio frequency - magnetron sputtering
In this study, silicon thin films had been successfully produced by using Very High Frequency-Plasma Enhanced Chemical Vapour Deposition (VHF-PECVD) technique. The phase transition from amorphous to crystalline silicon along with crystallite types remains unknown, especially at VHF region up to 200...
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| 格式: | Thesis |
| 语言: | English |
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2020
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| 在线阅读: | http://eprints.utm.my/id/eprint/101483/1/NorHarizKadirRosmanMFS2020.pdf |
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