Structural and optical properties of silicon carbide quantum dots grown by very high frequency plasma enhanced chemical vapour deposition
This study presents the synthesis of Silicon Carbide Quantum Dots (SiC QDs) by Very High Frequency-Plasma Enhanced Chemical Vapour Deposition (VHF-PECVD) method. Si (100) was used as a substrate where the growth was performed at a much lower temperature (100°C) than previous work. Besides, the growt...
Saved in:
主要作者: | Jusoh, Haezah Munyati |
---|---|
格式: | Thesis |
語言: | English |
出版: |
2020
|
主題: | |
在線閱讀: | http://eprints.utm.my/id/eprint/101977/1/HaezahMunyatiJusohMFS2020.pdf |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
相似書籍
-
The morphology and structural properties of silicon carbide quantum dots grown by very high frequency plasma enhanced chemical vapour deposition
由: Abd. Karim, Nur Farah Nadia
出版: (2019) -
Development of very high frequency plasma enhanced chemical vapour deposition for nanostructure silicon carbide thin film deposition
由: Omar, Muhammad Firdaus
出版: (2016) -
Comparison of the structural properties of silicon carbide using very high frequency plasma enhanced chemical vapour deposition with magnetron sputtering techniques
由: Azali, Muhamad Muizzudin
出版: (2022) -
Structural and optical properties of silicon/silicon carbide nanowires grown by hot-wire chemical vapour deposition /
由: Nurul Jannah Mohd Noor
出版: (2014) -
Phase change analysis of crystalline silicon thin film grown by very high frequency - plasma enhanced chemical vapour deposition and radio frequency - magnetron sputtering
由: Rosman, Nor Hariz Kadir
出版: (2020)