Re-crystallization of metallized silicon wafer with copper film by Q-switched Nd : YAG laser

The polycrystalline thin copper films on semiconductor substrates are of interest for many semiconductor devices. Hence the aim of this research is to recrystallize copper silicon thin film. In order to achieve this objective, the Q-switched Nd:YAG laser was employed as a source to re-crystallize th...

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Main Author: Ahmed Alegaily, Fatouma Millad
Format: Thesis
Language:English
Published: 2012
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Online Access:http://eprints.utm.my/id/eprint/33741/2/FatoumaMilladAhmedAlegailyMFS2012.pdf
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spelling my-utm-ep.337412018-04-27T01:26:45Z Re-crystallization of metallized silicon wafer with copper film by Q-switched Nd : YAG laser 2012-07 Ahmed Alegaily, Fatouma Millad QC Physics The polycrystalline thin copper films on semiconductor substrates are of interest for many semiconductor devices. Hence the aim of this research is to recrystallize copper silicon thin film. In order to achieve this objective, the Q-switched Nd:YAG laser was employed as a source to re-crystallize the doped silicon thin film (STF) with copper. A silicon thin film was prepared via low pressure physical vapor deposition (PVD). The STF was annealed by two techniques, first by using conventional method via tube furnace, second by using Q-switched Nd:YAG laser annealing. The microstructure of thin film was analyzed using Atomic Force Microscope (AFM). The results showed that, the grain size of the copper film increased with the energy density of the Nd:YAG laser. However, the grain size was found to reduce after exceeding the critical energy. The large grain size obtained for copper silicon thin film was 2426.04 nm at the corresponding energy density of 3989.48 mJ/cm-2. 2012-07 Thesis http://eprints.utm.my/id/eprint/33741/ http://eprints.utm.my/id/eprint/33741/2/FatoumaMilladAhmedAlegailyMFS2012.pdf application/pdf en public http://dms.library.utm.my:8080/vital/access/manager/Repository/vital:70528?site_name=Restricted Repository masters Universiti Teknologi Malaysia, Faculty of Science Faculty of Science
institution Universiti Teknologi Malaysia
collection UTM Institutional Repository
language English
topic QC Physics
spellingShingle QC Physics
Ahmed Alegaily, Fatouma Millad
Re-crystallization of metallized silicon wafer with copper film by Q-switched Nd : YAG laser
description The polycrystalline thin copper films on semiconductor substrates are of interest for many semiconductor devices. Hence the aim of this research is to recrystallize copper silicon thin film. In order to achieve this objective, the Q-switched Nd:YAG laser was employed as a source to re-crystallize the doped silicon thin film (STF) with copper. A silicon thin film was prepared via low pressure physical vapor deposition (PVD). The STF was annealed by two techniques, first by using conventional method via tube furnace, second by using Q-switched Nd:YAG laser annealing. The microstructure of thin film was analyzed using Atomic Force Microscope (AFM). The results showed that, the grain size of the copper film increased with the energy density of the Nd:YAG laser. However, the grain size was found to reduce after exceeding the critical energy. The large grain size obtained for copper silicon thin film was 2426.04 nm at the corresponding energy density of 3989.48 mJ/cm-2.
format Thesis
qualification_level Master's degree
author Ahmed Alegaily, Fatouma Millad
author_facet Ahmed Alegaily, Fatouma Millad
author_sort Ahmed Alegaily, Fatouma Millad
title Re-crystallization of metallized silicon wafer with copper film by Q-switched Nd : YAG laser
title_short Re-crystallization of metallized silicon wafer with copper film by Q-switched Nd : YAG laser
title_full Re-crystallization of metallized silicon wafer with copper film by Q-switched Nd : YAG laser
title_fullStr Re-crystallization of metallized silicon wafer with copper film by Q-switched Nd : YAG laser
title_full_unstemmed Re-crystallization of metallized silicon wafer with copper film by Q-switched Nd : YAG laser
title_sort re-crystallization of metallized silicon wafer with copper film by q-switched nd : yag laser
granting_institution Universiti Teknologi Malaysia, Faculty of Science
granting_department Faculty of Science
publishDate 2012
url http://eprints.utm.my/id/eprint/33741/2/FatoumaMilladAhmedAlegailyMFS2012.pdf
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