A correlation of oxide trap density and TDDB characteristics of very thin SiO2 films /
Saved in:
| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
1995.
|
| Subjects: | |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| LEADER | 00783cam a2200229 a 4500 | ||
|---|---|---|---|
| 001 | u392848 | ||
| 003 | SIRSI | ||
| 008 | 960208s1995 si v 00 1 eng m | ||
| 035 | |a ABZ-3631 | ||
| 040 | |a UMM | ||
| 090 | |a TK7871.15 |b F5Per | ||
| 100 | 1 | 0 | |a Perera, Merinnage Tamara Chandima. |
| 245 | 1 | 2 | |a A correlation of oxide trap density and TDDB characteristics of very thin SiO2 films / |c by Merinnage Tamara Chandima Perera. |
| 260 | |c 1995. | ||
| 300 | |a xii, 107 leaves : |b ill. ; |c 30 cm. | ||
| 504 | |a Bibliography: leaves 103-107. | ||
| 650 | 0 | |a Thin films |x Electric properties | |
| 650 | 0 | |a Silicon oxide films | |
| 650 | 0 | |a Metal oxide semiconductors. | |
| 948 | |a 08/02/1996 |b 17/08/1998 | ||
| 596 | |a 1 | ||
| 999 | |a TK7871.15 F5PER |w LC |c 1 |i A505458482 |l STACKS |m P01UTAMA |r Y |s Y |t TESIS |u 15/8/1996 | ||