A correlation of oxide trap density and TDDB characteristics of very thin SiO2 films /

A correlation of oxide trap density and TDDB characteristics of very thin SiO2 films /

محفوظ في:

التفاصيل البيبلوغرافية
المؤلف الرئيسي:	Perera, Merinnage Tamara Chandima
التنسيق:	كتاب
اللغة:	English
منشور في:	1995.
الموضوعات:	Thin films > Electric properties Silicon oxide films Metal oxide semiconductors.
الوسوم:	إضافة وسم لا توجد وسوم, كن أول من يضع وسما على هذه التسجيلة!

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