The influence of a layer of oxide on electromigration performance of Al/Cu/Si metal lines /

The influence of a layer of oxide on electromigration performance of Al/Cu/Si metal lines /

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書目詳細資料
主要作者:	Koh, David Khar Ann
格式:	Thesis 圖書
語言:	English
出版:	1995.
主題:	Electrodiffusion Metal oxide semiconductors. Integrated circuits > Very large scale integration. Metallic films.
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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